Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-12-30
1997-03-25
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430188, 430326, 430311, 528129, 210660, 210681, 210688, 437229, G03F 730, G03F 7004
Patent
active
056143524
ABSTRACT:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing treated chelated ion exchange resins to make the neutral ammonium salt or acid form. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
REFERENCES:
patent: 2929808 (1956-04-01), Ross et al.
patent: 4033909 (1977-07-01), Papa
patent: 4033910 (1977-07-01), Papa
patent: 4195138 (1980-03-01), Ward
patent: 4250031 (1981-02-01), Uejima et al.
patent: 4452883 (1984-06-01), Frenchik et al.
patent: 4567130 (1986-01-01), Held
patent: 4584261 (1986-04-01), Held
patent: 4636540 (1987-01-01), Warfel
patent: 4721665 (1988-01-01), Dooley et al.
patent: 4747954 (1988-05-01), Vaughn et al.
patent: 4784937 (1988-11-01), Tanaka et al.
patent: 4833067 (1989-05-01), Tanaka et al.
patent: 4914006 (1990-04-01), Kato et al.
patent: 5073622 (1991-12-01), Wojtech et al.
patent: 5116715 (1992-05-01), Roland
patent: 5118787 (1992-06-01), Furuno
patent: 5175078 (1992-12-01), Aoyama et al.
patent: 5212044 (1993-05-01), Liang et al.
patent: 5286606 (1994-12-01), Rahman et al.
patent: 5300628 (1994-04-01), Honda
patent: 5350714 (1994-09-01), Trefonas, III et al.
patent: 5378802 (1995-01-01), Honda
patent: 5446125 (1995-08-01), Honda et al.
Derwent Publication Ltd., London, GB; JP 05 234 876 (OCG Microelectronic Materials), 10 Sep. 1993.
G. Noti et al, "Deionized Water Plants for Semiconductor Device Fabrication", Proceedings of the Inst: Radio & Electron. Eng, Aust. (Australia), vol. 34, No. 2, Mar. 1973, pp. 45-51.
Bayard; "Water Free of Heavy Metals for Medical Use and Ion Exchange Resin Used in its Preparation"; Nov. 16, 1992; CA98(26).221589z.
Hirai et al; "Treatment of Waste Waters Containing Formaldehyde and Metals with Chelating Ion Exchange Resins"; Nov. 5, 1975; CA84(14):95328j.
Kimura et al; "Purification of Formaldehyde"; Mar. 9, 1977; CA87(7):52776y.
Journal of the Electrochemical Society, vol. 137, No. 12, Dec. 1990, Manchester, New Hampshire US, pp. 393900-3905, XP0001681, T. Tanada "A New Photolithography Tech. w/Antireflective . . . ".
Chemical Abstracts, vol. 112, No. 18, Apr./30/1990, Columbus, OH, p. 17, the Abstract 159201u, JP-1190713 (Inatomi, Shigeki et al) Jul./31/1989.
"Amberlite Ion Exchange Resins Laboratory Guide" by Rohm and HAAS Company, Philadelphia, PA, Sep. 1979.
Hamilton Cynthia
Hoechst Celanese Corporation
Sayko Jr. Andrew F.
LandOfFree
Metal ion reduction in novolak resins solution in PGMEA by chela does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Metal ion reduction in novolak resins solution in PGMEA by chela, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal ion reduction in novolak resins solution in PGMEA by chela will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2202135