Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-12-30
1996-05-28
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430311, 430905, 430188, 210660, 210681, 210688, 528129, 437229, G03F 07004, G03F 730, B01J 4100, C08G 812
Patent
active
055210520
ABSTRACT:
The present invention provides methods for producing water insoluble, aqueous alkali soluble, film forming novolak resins having an extremely low level of metal ions, utilizing treated anion and cation exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resin and for producing semiconductor devices using such photoresist compositions.
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Aubin Daniel P.
Khanna Dinesh N.
McKenzie Douglas
Rahman M. Dalil
Hamilton Cynthia
Hoechst Celanese Corporation
Sayko Jr. Andrew F.
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