Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1997-08-08
1999-01-12
Wong, Don
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511181, H05H 100
Patent
active
058595007
ABSTRACT:
In an apparatus in which a vacuum-arc discharge is generated between a metal cathode and anode plate and an evaporated substance from the cathode is supplied through openings on the anode plate, conventionally, a cleaning work to remove metal films deposited on the edges of the openings has to be done periodically, which limits continuous operation. The apparatus relating to the invention is provided with a rotary anode plate 14 on which a plurality of openings 17 are formed on a circumference concentric with the rotary axis of the anode plate. As the anode plate 14 rotates, the openings 17 are designed to come into a position to face the cathode. This construction can continue a longer operation with an extremely low deterioration of the performance without a maintenance work requiring a relief of the vacuum.
REFERENCES:
patent: 4714834 (1987-12-01), Shubaly
patent: 5071670 (1991-12-01), Kelly
Elkind Alexander
Munemasa Jun
Treglio James R
ISM Technologies, Inc.
Kabushiki Kaisha Kobe Seiko Sho
Vu David H.
Wong Don
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