Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1986-03-31
1986-12-09
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430309, 430326, 252156, 252528, 252529, 252541, 252547, 252548, G03C 524, G03C 534
Patent
active
046280235
ABSTRACT:
An aqueous metal ion-free developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is a quaternary ammonium compound. The developer permits a reduction of from 20-50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.
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Becker Paul E.
Cawston John F.
Bowers Jr. Charles L.
Goldberg Robert L.
Shipley Company Inc.
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