Metal-ion free, aqueous developer for photoresist layers

Details Metal-ion free, aqueous developer for photoresist layers Metal-ion free, aqueous developer for photoresist layers

1995-05-16

1998-03-24

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

510176, 510421, G03C 500

Patent

active

057311323

ABSTRACT:
The invention relates to a metal-ion-free developer which contains, in addition to at least one of the standard basic compounds, certain anionic and, optionally, non-ionic surfactants, and to a corresponding concentrate.

REFERENCES:
patent: 4239661 (1980-12-01), Muraoka et al.
patent: 4833067 (1989-05-01), Tanaka et al.
patent: 5292626 (1994-03-01), Buhr et al.

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