Metal-insulator transition switching transistor and method...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S192000

Reexamination Certificate

active

07408217

ABSTRACT:
Provided is a metal-insulator-transition switching transistor with a gate electrode on a silicon substrate (back-gate structure) and a metal-insulator-transition channel layer of VO2that changes from an insulator phase to a metal phase, or vice versa, depending on a variation of an electric field, and a method for manufacturing the same, whereby it is possible to fabricate a metal-insulator-transition switching transistor having high current gain characteristics and being stable thermally.

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patent: 2004/0069991 (2004-04-01), Dunn et al.
patent: 20030024156 (2003-03-01), None
patent: WO9534504 (1995-12-01), None
‘Observation of the Mott Transition in VO2Based Transistors’, Kim, Hyun-Tak, et al. Telecom. Basic Research Lab, ETRI, Daejeon 305-350, South Korea (Aug. 2, 2003) pp. 1-4.
‘Gate-Induced Mott Transition’. Kim, Hyun-Tak, et al. Telecom. Basic Research Lab, ETRI, Daejeon 305-350, Korea (May 27, 2003) pp. 1-4.
Kim, Hyun-Tak et al, “Gate Induced Mott Transition”, May 27, 2003,New Journal of Physics.
Malinenko, V.P, “Metal-Semiconductor Phase Transition in Structurally Disordered Vanadium Dioxide”. May 3, 1983,American Institute of Physics.
Zhang, J.G et al, “The Switching Mechanism in V205 Gel Films”, Mar. 14, 1988,Journal of Applied Physics.
Stefanovich, G. et al, “Electrical Switching and Mott Transition in VO2”, Jul. 24, 2000,Journal of Physics.
Boriskov, P.P et al, “The Effect of Electric Field on Metal-Insulator Phase Transition in Vanadium Dioxide”, Dec. 28, 2001,American Institute of Physics.

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