Coating processes – Spray coating utilizing flame or plasma heat – Metal or metal alloy coating
Patent
1997-03-24
1999-09-14
Utech, Benjamin
Coating processes
Spray coating utilizing flame or plasma heat
Metal or metal alloy coating
4274192, 427404, 427422, 427424, 427425, 427427, 427426, C23C 408
Patent
active
059520566
ABSTRACT:
Atomized metal is deposited metal onto a substrate so as to cause at least partial solidification of the deposited metal; further atomized metal is deposited onto the partially solidified deposited metal on the substrate; and the metal deposited onto the partially solidified deposited metal is allowed to fully solidify on the substrate; the cooling of the further deposited metal, and the composition of the metal and/or of a gas used in the atomization of the further atomized metal being tailored such that volumetric contraction on solidification and cooling of the further deposited metal is compensated for, when the deposited metal has been cooled to ambient temperature, by volumetric expansion in a reaction or phase change in the further deposited metal.
REFERENCES:
patent: 3976809 (1976-08-01), Dowell
patent: 4297135 (1981-10-01), Giessen et al.
patent: 4655852 (1987-04-01), Rollis
patent: 4666733 (1987-05-01), Wlodek
patent: 5338577 (1994-08-01), Burdette
patent: 5607779 (1997-03-01), Naoi
patent: 5656787 (1997-08-01), Shivanath et al.
patent: 5658506 (1997-08-01), White et al.
"Thermal Stability of NiCrAlY/PSZ FGM by Plasma Twin Torches Method" by Shinohara et al., ISIJ International, vol. 32 No. 8 (1992).
Jordan Richard Michael
Roche Allen Dennis
Champagne Donald L.
Gallagher Thomas A.
Gordon David P.
Jacobson David S.
Sprayform Holdings Limited
LandOfFree
Metal forming process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Metal forming process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal forming process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1508370