Metal etching composition

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156656, 252 792, 252 794, B44C 122, C23F 100, C09K 1300

Patent

active

050340930

ABSTRACT:
The present invention is directed to a chemical etching composition for etching metals or metallic alloys. The composition includes a solution of hydrochloric acid, phosphoric acid, ethylene glycol and an oxidizing agent. The etching composition is particularly useful for etching metal surfaces in preparation for subsequent fluorescent penetrant inspection.

REFERENCES:
patent: 4944807 (1990-07-01), Sova
patent: 4970015 (1990-11-01), Garcia

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