Metal deposition

Details Metal deposition Metal deposition

2011-01-11

2011-01-11

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S330000, C430S331000, C430S322000, C427S555000

Reexamination Certificate

active

07867686

ABSTRACT:
A method for electroless plating of metal on a laser-patterned substrate. A substrate is provided on which both a thermal imaging layer and catalytic layer are deposited. On exposure to a laser beam, sufficient levels of radiation are converted to heat in the thermal imaging layer to render the exposed regions of the adjacent catalytic layer inactive. The laser-patterned substrate is then exposed to a reaction solution which initiates the growth of a metal film on the unexposed regions of the catalytic layer.

REFERENCES:
patent: 4486463 (1984-12-01), Rubner et al.
patent: 4830880 (1989-05-01), Okubi et al.
patent: 5084299 (1992-01-01), Hirsch et al.
patent: 5192581 (1993-03-01), Hirsch et al.
patent: 6461678 (2002-10-01), Chen et al.
patent: 6605534 (2003-08-01), Chung et al.
patent: 6686256 (2004-02-01), Kanoh et al.
patent: 6847107 (2005-01-01), Fjelstad et al.
patent: 6900126 (2005-05-01), Carter et al.
patent: 7060617 (2006-06-01), Dubin et al.
patent: 0 484 808 (1992-05-01), None
patent: 61-61489 (1986-03-01), None
patent: 4-272182 (1992-09-01), None
patent: 6-77626 (1994-03-01), None
Japanese Office Action dated Jun. 16, 2009.

Affiliated with

Also associated with

Rating

Metal deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2637758