Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2007-05-15
2007-05-15
Hassanzadeh, Parviz (Department: 1763)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C438S052000
Reexamination Certificate
active
11380983
ABSTRACT:
A meso-electromechanical system (900, 1100) includes a substrate (215), a standoff (405, 1160) disposed on a surface of the substrate, a first electrostatic pattern (205, 1105, 1110, 1115, 1120) disposed on the surface of the substrate, and a glass beam (810). The glass beam (810) has a fixed region (820) attached to the standoff and has a second electrostatic pattern (815, 1205, 1210, 1215, 1220) on a cantilevered location of the glass beam. The second electrostatic pattern is substantially co-extensive with and parallel to the first electrostatic pattern. The second electrostatic pattern has a relaxed separation (925) from the first electrostatic pattern when the first and second electrostatic patterns are in a non-energized state. In some embodiments, a mirror is formed by the electrostatic materials that form the second electrostatic pattern. The glass beam may be patterned using sandblasting (140).
REFERENCES:
patent: 5454906 (1995-10-01), Baker et al.
patent: 5579151 (1996-11-01), Cho
patent: 6020215 (2000-02-01), Yagi et al.
patent: 6075639 (2000-06-01), Kino et al.
patent: 6290858 (2001-09-01), Hirtreiter et al.
patent: 6649852 (2003-11-01), Chason et al.
patent: 6714105 (2004-03-01), Eliacin et al.
patent: 6800820 (2004-10-01), Liu et al.
patent: 6859119 (2005-02-01), Eliacin et al.
patent: 2002/0149294 (2002-10-01), Matsumoto et al.
patent: 2005/0134141 (2005-06-01), Savic et al.
patent: 0046852 (2000-08-01), None
Belloy et al.: “Micromachining of Glass Inertia Sensors”, Journal of Microelectromechanical systems, vol. 11, No. 1, Feb. 2002, pp. 85-90.
Eliacin Manes
Liu Junhua
Savic Jovica
Tungare Aroon V.
Culbert Roberts
Hassanzadeh Parviz
Motorola Inc.
LandOfFree
Meso-microelectromechanical system having a glass beam and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Meso-microelectromechanical system having a glass beam and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Meso-microelectromechanical system having a glass beam and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3751245