Meso-microelectromechanical system having a glass beam and...

Etching a substrate: processes – Etching of semiconductor material to produce an article...

Reexamination Certificate

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C438S052000

Reexamination Certificate

active

11380983

ABSTRACT:
A meso-electromechanical system (900, 1100) includes a substrate (215), a standoff (405, 1160) disposed on a surface of the substrate, a first electrostatic pattern (205, 1105, 1110, 1115, 1120) disposed on the surface of the substrate, and a glass beam (810). The glass beam (810) has a fixed region (820) attached to the standoff and has a second electrostatic pattern (815, 1205, 1210, 1215, 1220) on a cantilevered location of the glass beam. The second electrostatic pattern is substantially co-extensive with and parallel to the first electrostatic pattern. The second electrostatic pattern has a relaxed separation (925) from the first electrostatic pattern when the first and second electrostatic patterns are in a non-energized state. In some embodiments, a mirror is formed by the electrostatic materials that form the second electrostatic pattern. The glass beam may be patterned using sandblasting (140).

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patent: 0046852 (2000-08-01), None
Belloy et al.: “Micromachining of Glass Inertia Sensors”, Journal of Microelectromechanical systems, vol. 11, No. 1, Feb. 2002, pp. 85-90.

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