Electric heating – Metal heating – By arc
Reexamination Certificate
2007-03-06
2007-03-06
Paschall, Mark (Department: 3742)
Electric heating
Metal heating
By arc
C219S121430, C219S121570, C118S7230IR
Reexamination Certificate
active
11105307
ABSTRACT:
A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor support, the electrode comprising a portion of the chamber wall, an RF power generator for supplying power at a frequency of the generator to the overhead electrode and capable of maintaining a plasma within the chamber at a desired plasma ion density level. The overhead electrode has a capacitance such that the overhead electrode and the plasma formed in the chamber at the desired plasma ion density resonate together at an electrode-plasma resonant frequency, the frequency of the generator being at least near the electrode-plasma resonant frequency. The reactor further includes a set of MERIE magnets surrounding the plasma process area overlying the wafer surface that produce a slowly circulating magnetic field which stirs the plasma to improve plasma ion density distribution uniformity.
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Buchberger, Jr. Douglas A.
Chiang Kang-Lie
Hagen Robert B.
Hoffman Daniel J.
Katz Dan
Law Office of Robert M. Wallace
Paschall Mark
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