Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-04-26
2008-11-11
Whitmore, Stacy A (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
Reexamination Certificate
active
07451428
ABSTRACT:
Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the second sub-resolution assist feature is determined. A merging technique is determined in accordance with the distance and the merge bar width. The first sub-resolution assist feature and the second sub-resolution assist feature are merged according to the identified merging technique.
REFERENCES:
patent: 2002/0155357 (2002-10-01), LaCour
patent: 2005/0208396 (2005-09-01), Lippincott
UMC and Synopsys Develop Reference Flow for UMC's Advanced Deep Submicron Processes, Collaboration Validates Synopsys' Galaxy Design Platform for UMC's 0.13 micron Process, Synopsys, Inc., Corporate, Copyright © 2005 Synopsys, Inc., http://www.synposys.com, 2 pages, May 3, 2004.
Mentor Graphics Calibre Approved Verification Tool for IBM-Chartered 90nm Design Enablement Platform, www.mentor.com, Copyright © 2002, Mentor Graphics Corporation, 8 pages, May 24, 2004.
TSMC and Synopsys Address Design Challenges for 90 Nanometer and Below with TSMC Reference Flow 5.0, Synopsys, Inc., Corporate, Copyright © 2005 Synopsys, Inc., http://www.synopsys.com, 3 pages, Jun. 7, 2004.
MaskTooks, Products/Profile, ASML MaskTools, Copyright © 2005 ASML, www.masktools.com, 13 pages, 2005.
Hercules Physical Verification Suite (PVS) The Industry's Fastest Physical Verification Solution, Synopsys, Inc., Products & Solutions, Copyright © 2005 Synopsys, Inc., http://www.synopsys.com, 4 pages, Jan. 6, 2005.
Product Overview, K2 Technologies, Copyright © 1995-2004, Cadence Design Systems, Inc. , 37 pages, Printed 2005.
Pending Patent Application filed Apr. 26, 2005, entitled “Modifying Merged Sub-Resolution Assist Features Of A Photolithographic Mask”, 40 pages specification, claims and abstract, 3 pages of drawings, inventors Sean C. O'Brien et al., Apr. 26, 2005.
O'Brien Sean C.
Zhang Guohong
Brady III W. James
Garner Jacqueline J.
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
Whitmore Stacy A
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