Meniscus proximity system for cleaning semiconductor...

Details Meniscus proximity system for cleaning semiconductor... Meniscus proximity system for cleaning semiconductor...

2008-04-01

2008-04-01

Perrin, Joseph L. (Department: 1792)

Drying and gas or vapor contact with solids

Apparatus

Means to remove liquid from treated material by contact with...

C134S099100, C134S902000, C034S407000

Reexamination Certificate

active

07350316

ABSTRACT:
A system and apparatus for cleaning a substrate is provided. The system includes a first head configured as a bar shape that extends approximately a diameter of the substrate. The first head is configured for placement on a first side of the substrate. A second head is also provided, and is configured as a bar shape that extends approximately the diameter of the wafer, and the second head is configured for placement on a second side of the substrate, such that the second side is opposite the first side. In this example, each of the first head and the second head have conduits formed therein along the diameter of the substrate for delivering and removing fluids so that a meniscus is capable of being contained between each of the first head and a substrate surface of the first side of the substrate and the second head and a substrate surface of the second side of the substrate.

REFERENCES:
patent: 6230722 (2001-05-01), Mitsumori et al.
patent: 6398975 (2002-06-01), Mertens et al.
patent: 6446358 (2002-09-01), Mitsumori et al.
patent: 6491764 (2002-12-01), Mertens et al.
patent: 6495005 (2002-12-01), Colgan et al.

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