MEMS device polymer film deposition process

Details MEMS device polymer film deposition process MEMS device polymer film deposition process

2007-02-06

2007-02-06

Smith, Zandra V. (Department: 2822)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S782000, C438S787000

Reexamination Certificate

active

10895477

ABSTRACT:
A method of depositing polymer thin films on a MEMS device having a wafer stack includes depositing one or more protection films on a polymer thin film layer on the wafer stack, fabricating the MEMS device, and removing the one or more protection films.

REFERENCES:
patent: 5834864 (1998-11-01), Hesterman et al.
patent: 6335224 (2002-01-01), Peterson et al.
patent: 6583524 (2003-06-01), Brandt
patent: 6635509 (2003-10-01), Ouellet
patent: 2004/0265182 (2004-12-01), Chen et al.
patent: 2005/0078348 (2005-04-01), Lin
patent: 2005/0158448 (2005-07-01), McNeish et al.
patent: 2005/0196900 (2005-09-01), Humphrey et al.
patent: 2005/0280106 (2005-12-01), Kim

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