MEMS device and fabrication method thereof

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Physical deformation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE29324

Reexamination Certificate

active

07838952

ABSTRACT:
A micro electro mechanical system (MEMS) device includes: a fixed electrode made of silicon and provided above a semiconductor substrate; a movable electrode made of silicon and arranged in a mechanically movable manner by having a gap from the semiconductor substrate; and a wiring layered part that is provided around the movable electrode, covers a portion of the fixed electrode and includes wiring. One of the fixed electrode and the movable electrode is implanted with an impurity ion and at least a part of the portion of the fixed electrode covered by the wiring layered part is silicidized.

REFERENCES:
patent: 5717279 (1998-02-01), Imura
patent: 6174820 (2001-01-01), Habermehl et al.
patent: 7344907 (2008-03-01), Colgan et al.
patent: 7352040 (2008-04-01), Partridge et al.
patent: 2001/0001075 (2001-05-01), Ngo et al.
patent: 2003/0042561 (2003-03-01), Funaki
patent: 2006/0180882 (2006-08-01), Sato et al.
patent: 2006/0226934 (2006-10-01), Ohguro
patent: 2007/0069342 (2007-03-01), Inaba
patent: 2008/0128841 (2008-06-01), Fujimori et al.
patent: 2009/0108381 (2009-04-01), Buchwalter et al.
patent: 2009/0194827 (2009-08-01), Ogino et al.
patent: 06-005622 (1994-01-01), None
patent: 08-236013 (1996-09-01), None
patent: 10-506196 (1998-06-01), None
patent: 10-335675 (1998-12-01), None
patent: 11-284068 (1999-10-01), None
patent: 11-284204 (1999-10-01), None
patent: 2001-076599 (2001-03-01), None
patent: 2001-264677 (2001-09-01), None
patent: 2004-221853 (2004-08-01), None
patent: 2006-247815 (2006-09-01), None
patent: 2006-255879 (2006-09-01), None
patent: WO 96/14660 (1996-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

MEMS device and fabrication method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with MEMS device and fabrication method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and MEMS device and fabrication method thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4181332

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.