MEMS based RF components with vertical motion and...

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Physical stress responsive

Reexamination Certificate

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C257SE21011

Reexamination Certificate

active

07858423

ABSTRACT:
A process of manufacturing parallel-plate microstructures by integrating the microstructures in a chip using a CMOS process is provided. A MEMS variable capacitor, a tunable band-pass filter, tunable matching networks, and capacitive RF-MEME switches all having vertically movable components and are integrated into a chip.

REFERENCES:
patent: 6583031 (2003-06-01), Lin
patent: 6635919 (2003-10-01), Melendez et al.
patent: 6798029 (2004-09-01), Volant et al.
patent: 7085122 (2006-08-01), Wu et al.

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