Memory with reduced sub-threshold leakage current in dynamic...

Static information storage and retrieval – Read/write circuit – Accelerating charge or discharge

Reexamination Certificate

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Details

C365S189110, C365S189050

Reexamination Certificate

active

06643199

ABSTRACT:

FIELD
Embodiments of the present invention relate to digital circuits, and more particularly, to high speed memory circuits.
BACKGROUND
Caches and register files are high speed memory used to store instructions and operands for instructions. They are critical components of microprocessors because of requirements for high speed and reliability. A portion of a computer system with high speed memory is abstracted at a high level in FIG.
1
. Microprocessor
102
comprises cache
104
and register files
106
. Cache
104
may be part of a memory hierarchy to store instructions and data, where system memory
108
is part of the memory hierarchy. Communication between microprocessor
102
with memory
108
is facilitated by memory controller (or chipset)
110
, which also facilitates in communicating with peripheral components
112
. Microprocessor communicates directly with memory controller
110
via bus or point-to-point interconnect
114
.
Because of the performance requirements placed upon caches and register files, high-performance domino type logic is often used. LOW-V
T
(low threshold voltage) transistors have been used in domino logic to improve speed, but the use of such devices may lead to an increase in sub-threshold leakage current. Sub-threshold leakage current may impact the performance of high speed memory if it is not reduced or taken into account.
Consider a typical implementation of a register file as illustrated in FIG.
2
. For simplicity,
FIG. 2
does not show any write ports, and shows only one read port (one local bit line). The bit line portion of a memory read port may be viewed as essentially a wide OR domino gate. In the particular example of
FIG. 2
, there are sixteen memory cells sharing local bit line
202
, but for simplicity only memory cells
204
and
206
are shown, where word line
208
is used to access memory cell
204
during a read operation, and word line
210
is used to access memory cell
206
during a read operation. The clock signal is denoted by &phgr;. The clock signal &phgr; is LOW (V
SS
) during a pre-charge phase, so that pMOSFET
212
is switched ON to pre-charge local bit line
202
HIGH (V
CC
). During an evaluation phase (read operation), the clock signal &phgr; is HIGH so that pMOSFET
212
is OFF, and a half keeper comprising pMOSFET
214
and inverter
216
continues to keep local bit line
202
charged unless it is otherwise discharged by one or more of the memory cells sharing local bit line
202
.
Ideally, local bit line
202
would only be discharged during a read operation if the information bit stored in the memory cell being read is such as to switch ON its associated access transistor. For example, if the state (stored information bit) of memory cell
204
is such that the gate voltage on access nMOSFET
218
is HIGH, then when word line
208
is HIGH during a read operation, memory cell
204
will discharge local bit line
202
. If, on the other hand, the information bit stored in memory cell
204
is such that the gate of access nMOSFET
218
is LOW, then local bit line
202
should maintain its charged state so that the stored information bit is correctly read. However, in a worst-case scenario, all other memory cells not being read may be such that the gate voltages on their respective access nMOSFETs are all HIGH, and consequently the accumulative effect of sub-threshold leakage current through their respective access nMOSFETs may be sufficiently large to discharge local bit line
202
to a voltage in which an incorrect read result is performed. The half-keeper comprising pMOSFET
214
may be sized larger to contend with the sub-threshold leakage, but this leads to an increase energy dissipation as well as a decrease in performance.
Many techniques have been suggested and taught for mitigating the effects of sub-threshold leakage current in high speed memory, as discussed above. For example, the circuit of
FIG. 3
is taught in “A 0.13 um 6 GHz 256×32b Leakage-Tolerant Register File,” by R. Krishnamurthy et al.,
2001
Symposium on VLSI Circuits Digest of Technical Papers, pp. 25-26, 2001. For simplicity,
FIG. 3
shows only two memory cells connected to local bit line
302
, but in practice there may be many such memory cells. Referring to memory cell
304
, when a read operation is performed on-this memory cell, word line
306
is held HIGH so that the source of access transistor
308
is brought to V
SS
, and the operation is similar to that of FIG.
2
. However, when no read operation is being performed on memory cell
304
, word line
306
is LOW, in which case pullup pMOSFET
310
charges the source of access transistor
308
to V
CC
. In this case, if local bit line
302
is HIGH, then both the source and drain of access transistor
308
are HIGH but its gate is at V
SS
, so that V
DS
is zero and V
GS
is −V
CC
, and consequently sub-threshold leakage current is essentially eliminated. (If local bit line
302
were LOW, then it was brought LOW by a memory cell being read, in which case sub-threshold leakage current is not an issue.)
However, if memory cell
304
is being read, and the stored information bit is such that the gate voltage of access transistor
308
is at V
SS
, then the gate-to-source voltage V
GS
=0 and the source-to-drain voltage V
DS
=V
CC
, and the resulting sub-threshold leakage current conducted by access transistor
308
should be supplied by the half-keeper to prevent false evaluation. Consequently, although unwanted sub-threshold leakage current for memory based upon the circuit of
FIG. 3
is essentially eliminated when a word line is held LOW, there nevertheless may be unwanted sub-threshold leakage current during a read operation.


REFERENCES:
patent: 5297104 (1994-03-01), Nakashima
patent: 5751643 (1998-05-01), Lines
“A 0.13 um 6GHz 256 ×32b Leakage-tolerant Register File”, Ram Krishnamurthy, et al., pp. 25-26, Mar. 2001.

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