Memory structures and methods of making same

Static information storage and retrieval – Systems using particular element – Amorphous

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365148, 365153, G11C 1100

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active

060727160

ABSTRACT:
Electrically erasable and rewritable memory structures with reversible states and good retention times may be constructed on flexible substrates using simple room-temperature deposition (e.g., printing) processes and curing temperatures below 110.degree. C. The memory structures are based on a polymer matrix having dispersed therein a particulate conductive or semiconductive material. When electrodes of suitable composition and geometry are used to apply electrical pulses of opposite polarity to the matrix material, reversible memory switching behavior is observed. In particular, subjection to positive or negative voltage pulses causes the devices to make fully-reversible transitions between low-resistance and high-resistance states.

REFERENCES:
patent: 5363329 (1994-11-01), Troyan
patent: 5920788 (1999-07-01), Reinberg
K.C. Park and S. Basavaiah, Proceedings of the Symposium on Semiconductor Effects in Amorphous Solids, pp. 284-333 (1970).
P.O. Sliva, G. Dir, and C. Griffiths, Proceedings of the Symposium on Semiconductor Effects in Amorphous Solids, pp. 316-333 (1970).
D.P. Oxley, "Memory Effects in Oxide Films", Oxides and Oxide Films, The Anodic Behavior of Metals and Semiconductors Series, vol. 6, pp. 251-322 (1981).
J.R. Heath, P.J. Kuekes, G.S. Snider, and R.S. Williams, "A Defect-Tolerant Computer Architecture: Opportunities for Nanotechnology," Science, vol. 280, pp. 1716-1721 (1998).

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