Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2005-10-18
2005-10-18
Thompson, Craig A. (Department: 2813)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C257S040000
Reexamination Certificate
active
06955939
ABSTRACT:
A method of making organic memory devices containing organic memory cells made of two electrodes with a controllably conductive media between the two electrodes is disclosed. The organic memory devices are made using a patternable, photosensitive dielectric that facilitates formation of the memory cells and mitigates the necessity of using photoresists.
REFERENCES:
patent: 4663270 (1987-05-01), Potember et al.
patent: 5589692 (1996-12-01), Reed
patent: 6045975 (2000-04-01), Tani et al.
patent: 6055180 (2000-04-01), Gudesen et al.
patent: 6208553 (2001-03-01), Gryko et al.
patent: 6212093 (2001-04-01), Lindsey
patent: 6272038 (2001-08-01), Clausen et al.
patent: 6281115 (2001-08-01), Chang et al.
patent: 6314019 (2001-11-01), Kuekes et al.
patent: 6320200 (2001-11-01), Reed et al.
patent: 6324091 (2001-11-01), Gryko et al.
patent: 6348700 (2002-02-01), Ellenbogen et al.
patent: 6396145 (2002-05-01), Nagai et al.
patent: 6509138 (2003-01-01), Gleason et al.
Cheung Patrick K.
Lyons Christopher F.
Tong Terence C.
Advanced Micro Devices , Inc.
Amin & Turocy LLP
Harrison Monica D.
Thompson Craig A.
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