Memory devices having sharp-tipped phase change layer patterns

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

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C257SE29170, C257S069000

Reexamination Certificate

active

07488981

ABSTRACT:
Phase change Random Access Memory (PRAM) devices include a substrate and a phase change layer pattern on the substrate. The phase change layer pattern includes a sharp tip and at least one wall that extends from the sharp tip in a direction away from the substrate. At least one contact hole node is provided that contacts the phase change material pattern adjacent the sharp tip.

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patent: 6586761 (2003-07-01), Lowrey
patent: 6908812 (2005-06-01), Lowrey
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patent: 7402897 (2008-07-01), Leedy
patent: 2003/0047727 (2003-03-01), Chiang
patent: 2006/0211165 (2006-09-01), Hwang et al.
Lee et al.,Phase Change Memory Devices Having Phase Change Area in Porous Dielectric Layer and Methods for Manufacturing the Same, U.S. Appl. No. 10/827,687, filed Apr. 19, 2004.
Hideki,Phase Changeable Memory Devices Including Carbon Nano Tubes and Methods for Forming the Same, U.S. Appl. No. 10/827,639, filed Apr. 19, 2004.

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