Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...
Reexamination Certificate
2004-12-21
2009-02-10
Garber, Charles D. (Department: 2812)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Field effect device in non-single crystal, or...
C257SE29170, C257S069000
Reexamination Certificate
active
07488981
ABSTRACT:
Phase change Random Access Memory (PRAM) devices include a substrate and a phase change layer pattern on the substrate. The phase change layer pattern includes a sharp tip and at least one wall that extends from the sharp tip in a direction away from the substrate. At least one contact hole node is provided that contacts the phase change material pattern adjacent the sharp tip.
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Lee et al.,Phase Change Memory Devices Having Phase Change Area in Porous Dielectric Layer and Methods for Manufacturing the Same, U.S. Appl. No. 10/827,687, filed Apr. 19, 2004.
Hideki,Phase Changeable Memory Devices Including Carbon Nano Tubes and Methods for Forming the Same, U.S. Appl. No. 10/827,639, filed Apr. 19, 2004.
Jeong Chang-Wook
Jeong Won-Cheol
Kim Hyeong-Jun
Park Jae-Hyun
Ford Kenisha V
Garber Charles D.
Myers Bigel Sibley & Sajovec P.A.
Samsung Electronics Co,. Ltd.
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