Drying and gas or vapor contact with solids – Process – Gas or vapor contact with treated material
Reexamination Certificate
2005-01-18
2005-01-18
Bueker, Richard (Department: 1763)
Drying and gas or vapor contact with solids
Process
Gas or vapor contact with treated material
C034S381000, C034S443000, C034S445000, C034S476000, C034S480000, C034S492000, C034S493000, C034S517000, C261S104000, C261S107000, C095S008000, C095S012000, C095S045000, C095S050000, C095S052000, C096S010000
Reexamination Certificate
active
06842998
ABSTRACT:
A system, method, and apparatus for supplying a gas-liquid vapor to a process tank for performing semiconductor manufacturing. In one aspect, the invention is a method of supplying a gas-liquid vapor to a process tank comprising: supplying a gas stream through at least one hydrophobic tube; exposing the outside surface of the hydrophobic tube to a liquid so that the liquid permeates the hydrophobic tube and enters the gas stream, forming a gas-liquid vapor inside the tube; and transporting the gas-liquid vapor to the process tank. In another aspect, the invention is an apparatus for supplying a gas-liquid vapor to a process tank comprising: at least one hydrophobic tube adapted to carry a gas; and a housing forming a chamber that surrounds the tube, the chamber adapted to receive a liquid that can permeate the tube, forming a gas-liquid vapor. In yet another aspect, the invention is a system for supplying a gas-liquid vapor to a process tank comprising: the apparatus of the present invention; gas supply means adapted to supply the gas to the tube; liquid supply means adapted to supply the liquid to the chamber; and gas-liquid transport means adapted to carry the gas-fluid vapor from the apparatus to the process tank.
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Kashkoush Ismail
Myland Larry
Novak Richard
Akrion LLC
Belles, Esq. Brian L.
Bueker Richard
Cozen O'Connor P.C.
Fein, Esq. Michael B.
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