Megasonic cleaning methods and apparatus

Details Megasonic cleaning methods and apparatus Megasonic cleaning methods and apparatus

1998-11-06

1999-12-28

Gulakowski, Randy

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 1, B08B 312, B08B 600

Patent

active

060067659

ABSTRACT:
A cleaning method for use in fabrication of integrated circuit devices includes immersing a surface of a substrate assembly into a cleaning solution having a first pH. The first pH of the cleaning solution is controlled by introducing gas bubbles into the cleaning solution. The gas bubbles include a reactive component that alters the first pH of the cleaning solution to attain a second pH of the cleaning solution that is different than the first pH.

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S. Wolf et al., "Silicon Processing for the VLSI Era", Process Technology, vol. 1, Title Page, Chapter 15, Lattice Press, Sunset Beach, CA, pp. 514-538 (1990).
Declaration of Guy F. Hudson, dated Sep. 11, 1997, 1 pg.

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