Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2011-03-22
2011-03-22
Markoff, Alexander (Department: 1711)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S001000, C134S018000, C134S032000, C134S033000, C134S184000, C134S902000
Reexamination Certificate
active
07909934
ABSTRACT:
A system and method of cleaning a substrate includes a megasonic chamber that includes a transducer and a substrate. The transducer is being oriented toward the substrate. A variable distance d separates the transducer and the substrate. The system also includes a dynamically adjustable RF generator that has an output coupled to the transducer.
REFERENCES:
patent: 6995067 (2006-02-01), Boyd et al.
patent: 2004/0154637 (2004-08-01), Boyd et al.
patent: 2004/0157348 (2004-08-01), Anderson et al.
patent: 2006/0000487 (2006-01-01), Boyd et al.
Anderson Thomas W.
Boyd John
Kuthi Andras
Smith Michael G. R.
Thie William
Lam Research Corporation
Markoff Alexander
Martine & Penilla & Gencarella LLP
LandOfFree
Megasonic cleaning efficiency using auto-tuning of a RF... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Megasonic cleaning efficiency using auto-tuning of a RF..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Megasonic cleaning efficiency using auto-tuning of a RF... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2733720