Megasonic cleaning efficiency using auto-tuning of a RF...

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Reexamination Certificate

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Details

C134S001000, C134S018000, C134S032000, C134S033000, C134S184000, C134S902000

Reexamination Certificate

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07909934

ABSTRACT:
A system and method of cleaning a substrate includes a megasonic chamber that includes a transducer and a substrate. The transducer is being oriented toward the substrate. A variable distance d separates the transducer and the substrate. The system also includes a dynamically adjustable RF generator that has an output coupled to the transducer.

REFERENCES:
patent: 6995067 (2006-02-01), Boyd et al.
patent: 2004/0154637 (2004-08-01), Boyd et al.
patent: 2004/0157348 (2004-08-01), Anderson et al.
patent: 2006/0000487 (2006-01-01), Boyd et al.

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