Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2005-08-09
2005-08-09
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S121000
Reexamination Certificate
active
06928334
ABSTRACT:
A software mechanism is provided for inter-fab mask process management. The mechanism is used for tracking and managing a plurality of lithographic masks through a semiconductor manufacturing environment. A virtual fab is established with a plurality of entities, each entity associated with an internal process to a semiconductor fab or an external process to the semiconductor fab. A state diagram tracks the plurality of lithographic masks through the plurality of entities of the virtual fab. Each of the plurality of lithographic masks is placed at a pre-determined state of the state diagram and a future location for each of the masks in the virtual fab is determined via the state diagram.
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Kuo, Birgie, “Enterprise Mask Process Management”, MIT e-Operations Symposium, Taiwan Semiconductor Manufacturing Co., Ltd. Manufacturing Information Technology Division (TSMC MITD), Jun. 2003, 10 pages.
Haynes and Boone LLP
Kosowski Alexander
Picard Leo
Taiwan Semiconductor Manufacturing Company , Ltd.
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