Mechanically stabilized retaining ring for chemical mechanical p

Details Mechanically stabilized retaining ring for chemical mechanical p Mechanically stabilized retaining ring for chemical mechanical p

1997-12-17

2000-05-30

Banks, Derris Holt

Abrading

Work holder

Work rotating

451 41, 451287, B24B 500, B24B 4702

Patent

active

060685484

ABSTRACT:
A carrier assembly for chemical mechanical polishing (CMP) includes a retaining ring removably attached to a rigid backing plate. The backing plate provides mechanical support over the entire load bearing surface of the retaining ring. In a further aspect of the present invention, a flexure clamp ring independent of the retaining ring for removably attaching the backing plate to the carrier assembly base Is included as part of the carrier assembly.

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patent: 5820448 (1998-10-01), Shamouilian et al.
patent: 5885135 (1999-03-01), Desorcie et al.
patent: 5906532 (1999-05-01), Nakajima et al.

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