Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1996-06-21
1998-04-14
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C23C 1434
Patent
active
057387702
ABSTRACT:
A target assembly in which the sputtering material is not soldered or otherwise metallurgically bonded to a backing plate. Rather, the target, which is homogeneously manufactured of sputtering material, is mechanically coupled (e.g., with bolts) to an adapter, which is itself permanently affixed to the chamber. As a result, the target can be easily uncoupled from the chamber and replaced, without also requiring removal and replacement of a backing plate.
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Gilman Paul S.
Hunt Thomas J.
Strauss David P.
Materials Research Corporation
Sony Corporation
Weisstuch Aaron
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