Measuring system for structures on a substrate for...

Details Measuring system for structures on a substrate for... Measuring system for structures on a substrate for...

2011-07-19

2011-07-19

Nguyen, Thong (Department: 2872)

Optical: systems and elements

Compound lens system

Microscope

C359S368000, C359S385000

Reexamination Certificate

active

07982950

ABSTRACT:
A measuring system is disclosed with enhanced resolution for periodic structures on a substrate for semiconductor manufacture. Aperture structures of varying geometries are provided in the illumination beam path. The aperture structures differ regarding the transmission characteristics of light, and which adjust the intensity distribution of the diffraction orders in the imaging pupil of the optical system.

REFERENCES:
patent: 5684626 (1997-11-01), Greenberg
patent: 6015644 (2000-01-01), Cirelli et al.
patent: 6396628 (2002-05-01), Osa et al.
patent: 6822740 (2004-11-01), Nomura
patent: 6891671 (2005-05-01), Greenberg
patent: 2007/0024966 (2007-02-01), Yamazaki et al.

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