Measuring phase errors on phase shift masks

Details Measuring phase errors on phase shift masks Measuring phase errors on phase shift masks

2006-05-24

2008-05-06

Young, Christopher G. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S005000, C430S030000, C257S048000, C257S797000, C382S144000, C382S145000

Reexamination Certificate

active

07368208

ABSTRACT:
Methods and apparatus for producing a semiconductor. A production reticle having a pattern that includes circuit features, phase shift target structures and overlay target structures is provided. The pattern is transferred multiple times across a test wafer surface for various focus levels to form a focus matrix. The pattern shift of the phase shift target structures is measured using an overlay metrology tool. The phase difference is calculated for each phase shift target structure, based on the pattern shift and the phase shift target structure focus level to qualify the phase difference of the production reticle. The pattern is transferred onto a production wafer when the phase difference meets desired limits. The pattern shift of the overlay target structures transferred to the production wafer is measured using an overlay metrology tool. The pattern placement error of the overlay target structures is calculated and the pattern placement error is qualified.

REFERENCES:
patent: 4251160 (1981-02-01), Bouwhuis et al.
patent: 4475811 (1984-10-01), Brunner
patent: 4538105 (1985-08-01), Ausschnitt
patent: 4703434 (1987-10-01), Brunner
patent: 4714874 (1987-12-01), Morris et al.
patent: 4757207 (1988-07-01), Chappelow et al.
patent: 4757707 (1988-07-01), Harvey et al.
patent: 4778275 (1988-10-01), van den Brink et al.
patent: 4782288 (1988-11-01), Vento
patent: 4820055 (1989-04-01), Muller
patent: 4855253 (1989-08-01), Weber
patent: 4929083 (1990-05-01), Brunner
patent: 5017514 (1991-05-01), Nishimoto
patent: 5100237 (1992-03-01), Wittekoek et al.
patent: 5112129 (1992-05-01), Davidson et al.
patent: 5148214 (1992-09-01), Ohta et al.
patent: 5156982 (1992-10-01), Nagoya
patent: 5172190 (1992-12-01), Kaiser
patent: 5216257 (1993-06-01), Brueck et al.
patent: 5262258 (1993-11-01), Yanagisawa
patent: 5296917 (1994-03-01), Kusonose et al.
patent: 5300786 (1994-04-01), Brunner et al.
patent: 5383136 (1995-01-01), Cresswell et al.
patent: 5414514 (1995-05-01), Smith et al.
patent: 5436097 (1995-07-01), Norishima et al.
patent: 5438413 (1995-08-01), Mazor et al.
patent: 5439767 (1995-08-01), Yamashita et al.
patent: 5477057 (1995-12-01), Angeley et al.
patent: 5479270 (1995-12-01), Taylor
patent: 5481362 (1996-01-01), van den Brink et al.
patent: 5498501 (1996-03-01), Shimoda et al.
patent: 5596413 (1997-01-01), Stanton et al.
patent: 5604819 (1997-02-01), Barnard
patent: 5617340 (1997-04-01), Cresswell et al.
patent: 5627083 (1997-05-01), Tounai et al.
patent: 5661546 (1997-08-01), Taniguchi
patent: 5665495 (1997-09-01), Hwang
patent: 5674650 (1997-10-01), Dirksen et al.
patent: 5699282 (1997-12-01), Allen et al.
patent: 5701013 (1997-12-01), Hsia et al.
patent: 5702567 (1997-12-01), Mitsui et al.
patent: 5703685 (1997-12-01), Senda et al.
patent: 5712707 (1998-01-01), Ausschnitt et al.
patent: 5757507 (1998-05-01), Ausschnitt et al.
patent: 5766809 (1998-06-01), Bae
patent: 5783342 (1998-07-01), Yamashita et al.
patent: 5805290 (1998-09-01), Ausschnitt et al.
patent: 5807647 (1998-09-01), Hashimoto
patent: 5835196 (1998-11-01), Jackson
patent: 5841114 (1998-11-01), Jeong
patent: 5856049 (1999-01-01), Lee
patent: 5857258 (1999-01-01), Penzes et al.
patent: 5872042 (1999-02-01), Hsu et al.
patent: 5877036 (1999-03-01), Kawai
patent: 5877861 (1999-03-01), Ausschnitt et al.
patent: 5902703 (1999-05-01), Leroux et al.
patent: 5912983 (1999-06-01), Hiratsuka
patent: 5923041 (1999-07-01), Cresswell et al.
patent: 5936738 (1999-08-01), Liebmann et al.
patent: 5939226 (1999-08-01), Tomimatu
patent: 5949145 (1999-09-01), Komuro
patent: 5960125 (1999-09-01), Michael et al.
patent: 5965309 (1999-10-01), Ausschnitt et al.
patent: 5968693 (1999-10-01), Adams
patent: 5976740 (1999-11-01), Ausschnitt et al.
patent: 6020966 (2000-02-01), Ausschnitt et al.
patent: 6023338 (2000-02-01), Bareket
patent: 6037671 (2000-03-01), Kepler et al.
patent: 6061606 (2000-05-01), Ross
patent: 6077756 (2000-06-01), Lin et al.
patent: 6079256 (2000-06-01), Bareket
patent: 6084679 (2000-07-01), Steffan et al.
patent: 6118185 (2000-09-01), Chen et al.
patent: 6128089 (2000-10-01), Ausschnitt et al.
patent: 6130750 (2000-10-01), Ausschnitt et al.
patent: 6137578 (2000-10-01), Ausschnitt
patent: 6140217 (2000-10-01), Jones et al.
patent: 6146910 (2000-11-01), Cresswell et al.
patent: 6160622 (2000-12-01), Dirksen et al.
patent: 6165656 (2000-12-01), Tomimatu
patent: 6384899 (2002-05-01), den Boef
patent: 6385772 (2002-05-01), Courtney
patent: 6396569 (2002-05-01), Zheng et al.
patent: 6416909 (2002-07-01), Quek et al.
patent: 6420075 (2002-07-01), Okamoto
patent: 6462818 (2002-10-01), Bareket
patent: 6486954 (2002-11-01), Mieher et al.
patent: 6596448 (2003-07-01), Lai et al.
patent: 6610448 (2003-08-01), Sato et al.
patent: 6674511 (2004-01-01), Nomura et al.
patent: 6710876 (2004-03-01), Nikoonahad et al.
patent: 6884552 (2005-04-01), Mieher et al.
patent: 6921916 (2005-07-01), Adel et al.
patent: 6937344 (2005-08-01), Monshouwer et al.
patent: 6985618 (2006-01-01), Adel et al.
patent: 7009704 (2006-03-01), Nikoonahad et al.
patent: 7068833 (2006-06-01), Ghinovker et al.
patent: 7075639 (2006-07-01), Adel et al.
patent: 7175945 (2007-02-01), Mieher et al.
patent: 7177457 (2007-02-01), Adel et al.
patent: 7181057 (2007-02-01), Adel et al.
patent: 2002/0018217 (2002-02-01), Weber-Grabau et al.
patent: 2002/0021434 (2002-02-01), Nomura et al.
patent: 2003/0002043 (2003-01-01), Abdulhalim et al.
patent: 2003/0048458 (2003-03-01), Mieher et al.
patent: 2003/0223630 (2003-12-01), Adel et al.
patent: 0818814 (1998-01-01), None
patent: 0947828 (1999-06-01), None
patent: 11067631 (1999-03-01), None
Written Opinion of the International Searching Authority, dated Dec. 12, 2005, from corresponding International Application No. PCT/US04/12506.
International Search Report, dated Dec. 12, 2005, from corresponding International Application No. PCT/US04/12506.
Farrar et al., “In-situ measurement of lens aberrations”, Mar. 2000 Proceedings of SPIE Vo. 4000, Optical Microlithography XIII.
Dirksen, et al., “Novel aberration monitor for optical lithography”, Part of the SPIE Conference on Optical Microlithography XII, Santa Clara, CA Mar. 1999, SPIE vol. 3676, p. 77-86.
Hsu et al., “Characterizing lens distortion to overlay accuracy by using fine measurement pattern”, Mar. 1999, SPIE vol. 3677.
Levinson et al., “Minimization of Total Overlay Errors on Product Wafers Using an Advanced Optimization Scheme”, SPIE vol. 3051 (1997) p. 362-373.
Levinson, “Lithography Process Control”, Tutorial Texts in Optical Engineering, vol. TT28, Chapter 5, pp. 96-107.
Monshouwer et al., “Method of Measuring Overlay”, Overlay, pp. 94-107, Chapter 5, Jun. 27, 2002.
Nikoonahad et al., Patent Application Entitled “Overlay Error Detection”, filed Oct. 26, 2000 as U.S. Appl. No. 09/697,025.
Normura, “Measurement of Wave-Front Aberrations in Lithography Lenses with an Overlay Inspection Tool”, Optical Review No. 8, vol. 4 (2001) p. 227-234.
Rivera et al., “Overlay Performance on Tungsten CMP Layers Using the ATHENA Alignment System”.
Schenker et al., “Alt-PSM for 0.10um and 0.13um poly patterning”, Proc. Of SPIE Vo. 4000, Optical Microlithography XIII, ed. C. Progler, Mar. 2000.
Office Action from U.S. Appl. No. 09/894,987 dated Jul. 2, 2004.
Office Action from U.S. Appl. No. 10/186,324 dated Aug. 25, 2004.
Office Action from U.S. Appl. No. 0/184,013 dated Aug. 25, 2004.
Office Action from U.S. Appl. No. 10/185,737 dated Jun. 5, 2003.
Final Office Action from U.S. Appl. No. 10/185,737 dated Dec. 3, 2003.
Office Action from U.S. Appl. No. 10/185,737 dated Jun. 30, 2004.
Office Action from U.S. Appl. No. 10/184,026 dated Aug. 25, 2004.
Office Action from U.S. Appl. No. 10/423,827, dated Oct. 6, 2005.
International Search Report dated Mar. 20, 2003, from corresponding International Application No. PCT/US02/35882.
International Search Report dated Jan. 31, 2002, from corresponding International Application No. PCT/US01/41932.
Offi

Affiliated with

Also associated with

Rating

Measuring phase errors on phase shift masks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Measuring phase errors on phase shift masks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measuring phase errors on phase shift masks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3984285