Measuring method and its apparatus

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S311000, C250S307000, C250S492300

Reexamination Certificate

active

07408155

ABSTRACT:
A method for measuring a dimension of a pattern formed on a sample using a secondary electron image obtained by picking up an image of the sample using a scanning electron microscope includes: obtaining a secondary electron image of a sample by picking up an image of the sample using a scanning electron microscope; creating, using the secondary electron image, an image profile of a pattern whose dimension is to be measured, within the obtained secondary electron image; retrieving a model profile that matches best with the created image profile from a plurality of model profiles prestored that are obtained from respective secondary electron images of a plurality of patterns, the cross sections of the plurality of patterns being of known shapes and dimensions and being different in shape; and obtaining a dimension of the pattern using information of the retrieved model profile.

REFERENCES:
patent: 6583413 (2003-06-01), Shinada et al.
patent: 7053371 (2006-05-01), Ojima et al.
patent: 7091485 (2006-08-01), Kang et al.
patent: 7095022 (2006-08-01), Nakasuji et al.
patent: 7098455 (2006-08-01), Shinada et al.
patent: 7173268 (2007-02-01), Tanaka et al.
patent: 2001/0006216 (2001-07-01), Koike
patent: 2001/0021546 (2001-09-01), Suwa
patent: 2005/0247876 (2005-11-01), Kawada et al.
patent: 2007/0023657 (2007-02-01), Takane et al.
patent: 11-316115 (1999-11-01), None
J.S. Villarrubia et al., “A Simulation Study of Repeatability and Bias in the CD-SEM”, Proceedings of SPIE vol. 5038 (2003), pp. 138-149.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Measuring method and its apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Measuring method and its apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measuring method and its apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4009649

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.