Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1995-11-27
1997-09-09
Hantis, K.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
G01B 1100
Patent
active
056662050
ABSTRACT:
A measuring method comprises a first step to expose by the irradiation of a predetermined energy ray onto the resist layer of a photosensitive board a first mask pattern having at least two linear pattern portions arranged substantially in axial symmetry with respect to a straight line in a predetermined first direction and inclined at a predetermined angle to the straight line in the first direction, a second step to overlap with the first mask pattern image exposed on the resist layer a second mask pattern formed by the linear patterns which extend in a second direction substantially perpendicular to the first direction by relatively driving the second mask pattern in a predetermined amount in the first direction for exposure, and a third step to measure an interval in the second direction between at least two wedge-shaped resist images formed by the overlapped portions of the first mask pattern and the second mask pattern. The difference between the measured value and a predetermined standard value of the interval in the second direction may be obtained to determined a positional deviation.
REFERENCES:
patent: 4579453 (1986-04-01), Makita
patent: 4585342 (1986-04-01), Lin et al.
patent: 4650983 (1987-03-01), Suwa
patent: 4803524 (1989-02-01), Ohno et al.
patent: 4871237 (1989-10-01), Anzai et al.
patent: 4908656 (1990-03-01), Suwa et al.
patent: 5117225 (1992-05-01), Wang
Webster's New World Dictionary; Third College Edition 1988, p. 707.
Imai Yuji
Kaise Koji
Suwa Kyoichi
Tateno Hiroki
Hantis K.
Nikon Corporation
LandOfFree
Measuring method and exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Measuring method and exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measuring method and exposure apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-73353