Measuring apparatus

Details Measuring apparatus Measuring apparatus

2006-03-14

2006-03-14

Stafira, Michael P. (Department: 2877)

Optics: measuring and testing

Position or displacement

C356S315000

Reexamination Certificate

active

07012702

ABSTRACT:
A width measuring apparatus is provided with a control unit, an imaging system and a spectroscopic unit. The control unit performs image processing (edge detection processing) on image data obtained by imaging an end of a substrate thereby detecting the position of the end of the substrate. The control unit further measures the thickness of a thin film on the basis of a spectral signal from the spectroscopic unit and detects the position of an end of the thin film from distribution of the thickness. The control unit calculates and displays the width between the end of the thin film and the end of the substrate on the basis of the detected positions of the ends of the substrate and the thin film. The width measuring apparatus can also detect the position of the end of the thin film from image data acquired by the imaging system. Therefore, it is possible to provide a measuring apparatus automatically measuring the width between the end of the thin film formed on the substrate and the end of the substrate.

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English translation of Abstract for Japanese Patent Application Laid-Open No. 5-175117.
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English translation of Abstract for Japanese Patent Application Laid-Open No. 2001-127036.
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