Measurement system for correcting overlay measurement error

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07908105

ABSTRACT:
A measurement system and a measurement method, which can obtain a measurement value close to a true value considering an overlay measurement error according to a higher order regression analysis model, is disclosed. The measurement system and the measurement method provide a technique for determining optimal positions of shots to be measured using an optimal experimental design. When the regression analysis model and the number of shots to be measured are determined in advance, a method is used for determining an optimal number of shots to be measured according to the regression analysis model and process dispersion using a confidence interval estimating method.

REFERENCES:
patent: 5960185 (1999-09-01), Nguyen
patent: 6613589 (2003-09-01), Ziger
patent: 7062410 (2006-06-01), Winstead et al.
patent: 2002/0044269 (2002-04-01), Yonekawa et al.
patent: 2003/0059691 (2003-03-01), Morimoto
patent: 2003/0091914 (2003-05-01), Cho
patent: 2003/0104640 (2003-06-01), Ziger
patent: 2003/0152848 (2003-08-01), Leroux et al.
patent: 2005/0095515 (2005-05-01), Pellegrini
patent: 2005/0110012 (2005-05-01), Lee et al.
patent: 2006/0092420 (2006-05-01), Oishi
patent: 2003-100604 (2003-04-01), None
patent: 2006-148013 (2006-06-01), None
patent: 2006-0035083 (2006-04-01), None
English language abstract of Korean Publication No. 2006-0035083.
English language abstract of Japanese Publication No. 2003-100604.
English language abstract of Japanese Publication No. 2006-148013.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Measurement system for correcting overlay measurement error does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Measurement system for correcting overlay measurement error, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measurement system for correcting overlay measurement error will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2624874

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.