Measurement of thin films using fourier amplitude

Details Measurement of thin films using fourier amplitude Measurement of thin films using fourier amplitude

2005-12-15

2009-11-03

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

07612891

ABSTRACT:
Thin-film thickness and refractive index are measured using the Fourier amplitude of a broadband interferometric spectrum. Due to the smooth nature of the Fourier amplitude as a function of wavelength, as compared to the fast varying Fourier phase conventionally used to measure thickness, increased stability and repeatability of measurement are achieved. As a result, measurements of ultra-thin films with thickness below 100 nm are possible with reliable results.

REFERENCES:
patent: 6545763 (2003-04-01), Kim et al.
patent: 6624894 (2003-09-01), Olszak et al.
patent: 7106454 (2006-09-01), De Groot et al.
patent: 2002/0196450 (2002-12-01), Olszak et al.
patent: 2006/0176522 (2006-08-01), Mansfield et al.

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