Measurement of etching

Etching a substrate: processes – Forming or treating thermal ink jet article

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07494596

ABSTRACT:
Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.

REFERENCES:
patent: 4351706 (1982-09-01), Chappell et al.
patent: 4358338 (1982-11-01), Downey et al.
patent: 4648936 (1987-03-01), Ashby et al.
patent: 4767496 (1988-08-01), Hieber
patent: 5015323 (1991-05-01), Gallagher
patent: 5055889 (1991-10-01), Beall
patent: 5132648 (1992-07-01), Trinh et al.
patent: 5357131 (1994-10-01), Sunami et al.
patent: 5573624 (1996-11-01), Barbee et al.
patent: 5591300 (1997-01-01), Schiller
patent: 5637189 (1997-06-01), Peeters et al.
patent: 5699282 (1997-12-01), Allen et al.
patent: 5788801 (1998-08-01), Barbee et al.
patent: 5872390 (1999-02-01), Lee et al.
patent: 5879973 (1999-03-01), Yanai et al.
patent: 6015978 (2000-01-01), Yuki et al.
patent: 6016062 (2000-01-01), Nicollian et al.
patent: 6084648 (2000-07-01), Yeo
patent: 6127237 (2000-10-01), Tsuchiaki
patent: 6204073 (2001-03-01), Nandakumar et al.
patent: 6228690 (2001-05-01), Mikuni
patent: 6297644 (2001-10-01), Jarvis et al.
patent: 6323097 (2001-11-01), Wu et al.
patent: 6342401 (2002-01-01), Tom
patent: 6437567 (2002-08-01), Schenck et al.
patent: 6448098 (2002-09-01), Milor
patent: 6476458 (2002-11-01), Miyajima
patent: 6531379 (2003-03-01), Furukawa et al.
patent: 6573561 (2003-06-01), Chidambarrao et al.
patent: 6599761 (2003-07-01), Hess et al.
patent: 6762133 (2004-07-01), Rangarajan et al.
patent: 6828647 (2004-12-01), Schafbauer et al.
patent: 6969655 (2005-11-01), Kim
patent: 2001/0010573 (2001-08-01), Ohta et al.
patent: 2001/0054709 (2001-12-01), Heath et al.
patent: 2002/0176276 (2002-11-01), Zhang et al.
patent: 2002/0185469 (2002-12-01), Podlesnik et al.
patent: 2003/0022397 (2003-01-01), Hess et al.
patent: 2003/0027397 (2003-02-01), Gau
patent: 2003/0042800 (2003-03-01), Money
patent: 2003/0142453 (2003-07-01), Parker et al.
patent: 2003/0168715 (2003-09-01), Bae
patent: 2004/0021155 (2004-02-01), Harada
patent: 2004/0021743 (2004-02-01), Ottenheimer et al.
patent: 2004/0066601 (2004-04-01), Larsen
patent: 2004/0241999 (2004-12-01), Livengood et al.
patent: 2005/0017313 (2005-01-01), Wan
patent: 58147123 (1983-09-01), None
patent: 60-167332 (1985-08-01), None
patent: 10044407 (1998-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Measurement of etching does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Measurement of etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measurement of etching will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4135432

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.