Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2003-03-21
2009-02-24
Olsen, Allan (Department: 1792)
Etching a substrate: processes
Forming or treating thermal ink jet article
Reexamination Certificate
active
07494596
ABSTRACT:
Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
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Barnes Ted W.
Chavarria Victorio
Emery Timothy R.
Ghozeil Adam
Sudyka William J.
Hewlett--Packard Development Company, L.P.
Olsen Allan
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