X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1983-01-14
1984-12-18
Smith, Alfred E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
364508, G01N 2320
Patent
active
044894252
ABSTRACT:
A polycrystalline sample is irradiated with a collimated beam of substantially monochromatic X-ray radiation to form a diffraction come which extends and expands outwardly from the sample. A substantially planar, two-dimensional, position sensitive detector is disposed across the cone to intercept and thereby form a two-dimensional image of at least a substantial portion of the cone's cross-sectional periphery. A theoretical relationship exists between the shape of the cone's image and the residual stress in the sample such that the image can be analyzed to quantitatively determine the residual stress.
REFERENCES:
patent: 2259708 (1941-10-01), Schiebold
patent: 3023311 (1962-02-01), Bessen
patent: 3934138 (1976-01-01), Bens
patent: 4042825 (1977-08-01), Ruud
Hayama, et al., "Automation of X-Ray Stress Measurement by Small Digital Computer", 1973, Symposium on Mechanical Behavior of Materials, Kyoto, Japan, Aug. 21-23, 1973.
Grigsby T. N.
Science Applications, Inc.
Slonecker Michael L.
Smith Alfred E.
Verbeck Bruno J.
LandOfFree
Means and method for determining residual stress on a polycrysta does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Means and method for determining residual stress on a polycrysta, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Means and method for determining residual stress on a polycrysta will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1992098