4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Diffraction, reflection, or scattering analysis

Giancarlo Borgonovi

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Means and method for determining residual stress on a polycrysta

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent

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System and method for analyzing content data

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Chemical analysis
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1784504

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