MBE system with in-situ mounting

Details MBE system with in-situ mounting MBE system with in-situ mounting

1983-11-10

1986-08-12

Bernstein, Hiram H.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

422247, 414222, 414217, 269287, 118726, 118503, C30B 2306

Patent

active

046054693

ABSTRACT:
A molecular beam epitaxy system wherein the molybdenum substrate holder and the molybdenum ring which assembles to the substrate holder to hold the wafer are kept in vacuum essentially all the time. Wafers are not pre-mounted to substrate holders, but the wafer mounting step is performed in ultrahigh vacuum after a cassette of wafers has already been loaded and outgassed, under ultrahigh vacuum. Thus, the substrate holder can be outgassed separately at high temperatures, and can remain under high vacuum.

REFERENCES:
patent: 4137865 (1979-02-01), Cho
patent: 4201152 (1980-05-01), Luscher
patent: 4308756 (1982-01-01), Robinson et al.
patent: 4378189 (1983-03-01), Takeshita et al.
Pamplin, Crystal Growth, Pergamon, pp. 221-231, 1980, second edition.

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