Materials for polishing liquid for metal, polishing liquid...

Details Materials for polishing liquid for metal, polishing liquid... Materials for polishing liquid for metal, polishing liquid...

2007-07-31

2007-07-31

Schillinger, Laura M. (Department: 2813)

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

C438S693000

Reexamination Certificate

active

09869347

ABSTRACT:
Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.

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