Matching data related to multiple metrology tools

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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Details

C700S095000, C700S117000, C716S030000, C438S005000

Reexamination Certificate

active

06978189

ABSTRACT:
A method and an apparatus for matching data related to an integrated metrology tool and a standalone metrology tool. At least one semiconductor wafer is processed. An integrated metrology tool and/or a standalone metrology tool is matched based upon a difference between metrology data relating to a processed semiconductor wafer acquired by the integrated metrology tool and metrology data acquired by the standalone metrology tool, using a controller.

REFERENCES:
patent: 6806951 (2004-10-01), Wack et al.
patent: 2002/0165636 (2002-11-01), Hasan

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