Master base for fabrication and method for manufacturing the...

Details Master base for fabrication and method for manufacturing the... Master base for fabrication and method for manufacturing the...

2005-12-27

2005-12-27

Pham, Hoai (Department: 2829)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C438S022000

Reexamination Certificate

active

06979527

ABSTRACT:
A master base for fabrication includes a substrate, a first photoresist layer disposed on the substrate, and a second photoresist layer disposed on the first photoresist layer, wherein the first photoresist layer attenuates or absorbs rays reflected at the interface between the first photoresist layer and the substrate to prevent the reflected rays from interfering with applied rays in a exposing step. A method for manufacturing a master base for fabrication includes the steps of forming a first photoresist layer on a substrate, baking the first photoresist layer at the setting temperature of the first photoresist layer, and forming a second photoresist layer on the first photoresist layer.

REFERENCES:
patent: 5286605 (1994-02-01), Nishioka et al.
patent: 5587090 (1996-12-01), Belcher et al.
patent: 6475819 (2002-11-01), Franz
patent: 2002/0110755 (2002-08-01), Tsai et al.
patent: 2004/0082096 (2004-04-01), Yamamoto

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