Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2005-06-07
2005-06-07
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C118S715000, C156S345310, C156S345320, C156S345330
Reexamination Certificate
active
06902624
ABSTRACT:
A method and apparatus for the use of individual vertically stacked ALD or CVD reactors. Individual reactors are independently operable and maintainable. The gas inlet and output are vertically configured with respect to the reactor chamber for generally axi-symmetric process control. The chamber design is modular in which cover and base plates forming the reactor have improved flow design.
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International Search Report for PCT/US 02/34714, mailed Apr. 7, 2003 (9 pages).
Doering Ken
Jansz Adrian
Puchacz Jurek
Seidel Thomas E.
Blakely Sokoloff Taylor & Zafman LLP.
Genus Inc.
Hassanzadeh Parviz
Moore Karla
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