4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Ken Doering

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Massively parallel atomic layer deposition/chemical vapor...

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Purged heater-susceptor for an ALD/CVD reactor

Electric heating – Heating devices – Combined with container – enclosure – or support for material...
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Profile ID: LFUS-PAI-P-2891871

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