Mass flow sensor having a measuring element arranged on a membra

Details Mass flow sensor having a measuring element arranged on a membra Mass flow sensor having a measuring element arranged on a membra

1994-07-21

1995-11-21

Chilcot, Richard

Measuring and testing

Volume or rate of flow

Thermal type

7320423, G01F 168

Patent

active

054676495

ABSTRACT:
A mass flow sensor includes a measuring element arranged on a membrane that is clamped in a frame. The sensor is formed by introducing a recess into a silicon wafer. Through the application of a recess having perpendicular walls, the thickness of the frame can be reduced, thus allowing the required surface area of the wafer to also be reduced.

REFERENCES:
patent: 4594889 (1986-06-01), McCarthy
patent: 4624137 (1986-11-01), Johnson et al.
patent: 4624138 (1986-11-01), Ono et al.
patent: 4677850 (1987-07-01), Miura et al.
patent: 4841769 (1989-06-01), Porth et al.
patent: 4888988 (1989-12-01), Lee et al.

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