Masks and methods of manufacture thereof

Details Masks and methods of manufacture thereof Masks and methods of manufacture thereof

2009-11-25

2010-12-28

Rosasco, Stephen (Department: 1795)

Photocopying

Projection printing and copying cameras

Step and repeat

C430S005000

Reexamination Certificate

active

07859645

ABSTRACT:
Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment includes a method of generating an assist feature of a lithography mask. The method includes providing a layout for a material layer of a semiconductor device, the layout including a pattern for at least one feature of the semiconductor device. The method includes forming an assist feature in the pattern for the at least one feature, wherein the assist feature extends completely through the pattern for the at least one feature.

REFERENCES:
patent: 5242770 (1993-09-01), Chen et al.
patent: 5821014 (1998-10-01), Chen et al.
patent: 6413683 (2002-07-01), Liebmann et al.

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