Maskless vortex phase shift optical direct write lithography

Details Maskless vortex phase shift optical direct write lithography Maskless vortex phase shift optical direct write lithography

2004-12-14

2011-11-15

Chea, Thorl (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C359S279000, C359S290000, C359S291000, C359S295000, C359S298000

Reexamination Certificate

active

08057963

ABSTRACT:
The present invention provides methods and apparatus for accomplishing a optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is configured to generate vortex phase shift optical patterns that are directed onto a photosensitive layer of a substrate. The lithography methods and systems facilitate pattern transfer using such vortex phase shift exposure patterns.

REFERENCES:
patent: 6504644 (2003-01-01), Sandstrom
patent: 6811933 (2004-11-01), Levenson
patent: 7189498 (2007-03-01), Eib et al.
Yashesh Shroff et al., “Optical Analysis of Mirror Based Pattern Generation”, Proceedings of SPIE, vol. 5037 (2003), pp. 550-559.
U.S. Appl. No. 10/825,342, entitled: “Optimized Mirror Design for Optical Direct Write”, by inventors Nicholas Eib et al., filed Apr. 14, 2004.
U.S. Appl. No. 10/988,087, entitled: “Process and Apparatus for Applying Apodization to Maskless Optical Direct Write Lithography Processes”, by inventors Nicholas K. Eib et al., filed Nov. 12, 2004.
U.S. Appl. No. 10/993,603, entitled: “Process and Apparatus for Generating a Strong Phase Shift Optical Pattern for Use in an Optical Direct Write Lithography Process”, by inventors Nicholas K. Eib et al., filed Nov. 19, 2004.
Marc D. Levenson et al., “The Vortex Mask: Making 80 nm Contacts with a Twist!”, Proceedings of SPIE, vol. 4889 (2002), pp. 1293-1303.
Marc D. Levenson et al., “The Vortex Via Process: Analysis and Mask Fabrication for Contact CDs<80 nm”, Proceedings of SPIE, vol. 5040 (2003), pp. 344-370.
Marc D. Levenson et al., “Vortex Via Validation”, Proceedings of SPIE, vol. 5256 (2003), pp. 93-100.
Marc D. Levenson et al., “Advances in Vortex Via Fabrication”, Proceedings of SPIE, vol. 5377 (2004), pp. 1237-1246.

Affiliated with

Also associated with

Rating

Maskless vortex phase shift optical direct write lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Maskless vortex phase shift optical direct write lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Maskless vortex phase shift optical direct write lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4297160