Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2006-02-21
2006-02-21
Mulpuri, Savitri (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
Reexamination Certificate
active
07001788
ABSTRACT:
A method of fabricating a waveguide mirror that involves etching a trench in a silicon substrate; depositing a film (e.g. silicon dioxide) over the surface of the silicon substrate and into the trench; ion etching the film to remove at least some of the deposited silicon dioxide and to leave a facet of film in inside corners of the trench; depositing a layer of SiGe over the substrate to fill up the trench; and planarizing the deposited SiGe to remove the SiGe from above the level of the trench.
REFERENCES:
patent: 5357122 (1994-10-01), Okubora et al.
patent: 5987196 (1999-11-01), Noble
patent: 5991487 (1999-11-01), Sugiyama
patent: 6307242 (2001-10-01), Sugiyama
patent: 6645829 (2003-11-01), Fitzgerald
patent: 6677655 (2004-01-01), Fitzgerald
patent: 6680495 (2004-01-01), Fitzgerald
patent: 2002/0174826 (2002-11-01), Maydan et al.
patent: 2002/0174827 (2002-11-01), Samoilov et al.
patent: 2003/0015770 (2003-01-01), Talin et al.
patent: 2003/0052082 (2003-03-01), Khan et al.
patent: 2003/0072548 (2003-04-01), Bhardwaj et al.
patent: 2003/0110808 (2003-06-01), M'Saad et al.
patent: 2003/0113085 (2003-06-01), M'Saad
patent: 2003/0114006 (2003-06-01), White
patent: 2003/0118310 (2003-06-01), Steinberg et al.
patent: 2003/0213961 (2003-11-01), Morse
patent: 2003/0227072 (2003-12-01), Forbes et al.
patent: 2004/0038434 (2004-02-01), Kobayashi et al.
patent: 2004/0114853 (2004-06-01), Bjorkman et al.
patent: 0 661 561 (1995-07-01), None
patent: WO 03/036369 (2003-05-01), None
Chen et al., “Fully Embedded Board-Level Guided-Wave Optoelectronic Interconnects,” Proceedings of the IEEE, vol. 88, No. 6, Jun. 2000, pp. 780-793.
Choi et al., “Self-Aligning Silicon Groove Technology Platform for the Low Cost Optical Module,” 1999 Electronic Components and Technology Conference, IEEE, pp. 1140-1144.
Jalali et al., “Advances in Silicon-on-Insulator Optoelectronics,” IEEE Journal of Selected Topics in Quantum Electronics, vol. 4, No. 6, Nov./Dec. 1998, pp. 938-947.
Kimerling, “Photons to the Rescue: Microelectronics Becomes Microphotonics,” The Electrochemical Society Interface, Summer 2000, pp. 28-31.
Kostal, “Nano-optics Changes the Rules for Optical Components,” NanoOpto White Paper 2002.001, Jun. 2002, pp. 1-6.
Kostal and Park, “Nano-optics: New Rules for Optical System Design,” NanoOpto White Paper 2002.002, Jun. 2002, pp. 1-10.
Labun, “Profile Simulation of Electron Cyclotron Resonance Planarization of an Interlevel Dielectric,” J. Vac. Sci. Tecnol. B. 12(6), 1994, pp 3138-3144.
Machida et al., “SiO2 Planarization Technology With Biasing and Electron Cyclotron Resonance Plasma Deposition for Submicron Interconnections,” J. Vac. Sci Technol. B, vol. 4, No. 4, 1986, pp 818-821.
Machida et al., “Effect of Oxygen Ions on Filling SiO2 Into Holes Using Biased Electron Cyclotron Resonance Plasma Deposition,” J. Vac. Sci. Technol. B, 11(2), 1993, pp 224-227.
Motorola Labs, “The Discovery: Motorola Labs solves a 30-year semiconductor industry puzzle,” Jun. 2002.
Walker et al., “Design and fabrication of high-efficiency beam splitters and beam deflectors for integrated planar micro-optic systems,” Applied Optics, vol. 32, No. 14, May 10, 1993, pp. 2494-2501.
Walker et al., “Optical clock distribution using integrated free-space optics,” Optics Communications 90 (1992) pp. 359-371.
Leon Francisco A.
Wada Yuichi
West Lawrence C.
Wojcik Gregory L.
Applied Materials Inc.
Mulpuri Savitri
Wilmer Cutler Pickering Hale and Dorr LLP
LandOfFree
Maskless fabrication of waveguide mirrors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Maskless fabrication of waveguide mirrors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Maskless fabrication of waveguide mirrors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3659710