Masking paste, method of manufacturing same, and method of...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant

Reexamination Certificate

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C438S476000, C438S546000, C438S549000, C438S550000, C438S552000, C438S555000, C438S556000, C257SE21135, C257SE21141, C257SE21142, C257SE21143, C257SE21144

Reexamination Certificate

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07846823

ABSTRACT:
A masking paste used as a mask for controlling diffusion when diffusing a p-type dopant and an n-type dopant into a semiconductor substrate and forming a high-concentration p-doped region and a high concentration n-doped region is provided that contains at least a solvent, a thickening agent, and SiO2precursor and/or a TiO2 precursor. Further, a manufacturing method of a solar cell is provided in which the masking paste is pattern-formed on the semiconductor substrate and then the p-type dopant and the n-type dopant are diffused.

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International Search Report mailed Nov. 7, 2006.

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