Masking layer having narrow isolated spacings and the method for

Details Masking layer having narrow isolated spacings and the method for Masking layer having narrow isolated spacings and the method for

1995-03-14

1996-11-12

Turner, Archene

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

257341, 257506, 257510, 257515, 257520, 257647, 428195, 428446, 428698, 428701, 428702, H01L 21306

Patent

active

055738370

ABSTRACT:
An etch mask having a narrow spacer layer self-aligned and adjacent to a first portion of an inorganic first layered segment. An inorganic second layered segment comprises a portion of the etch mask and encompasses a perimeter of the first layered segment and is distanced from the first layered segment by a distance equal to a thickness of the narrow spacer layer. A first portion of the second layered segment is adjacent to the narrow spacer layer. A void exists between second portions of the first and the second layered segments. The area of the substrate exposed by the etch mask of the invention, when etched, forms a trench whose width is limited only by the width of the void which is equal to the width of the narrow spacer layer. The narrowness of the narrow isolated trench formed using the etch mask of the invention maximizes die space.

REFERENCES:
patent: 3962717 (1976-06-01), O'Brien
patent: 4255207 (1981-03-01), Nicolay et al.
patent: 4269636 (1981-05-01), Rivoli et al.
patent: 4502914 (1985-03-01), Trumpp et al.
patent: 4598461 (1986-07-01), Love
patent: 4657630 (1987-04-01), Agatsuma
patent: 4882291 (1989-11-01), Jeuch
patent: 5047117 (1991-09-01), Roberts
patent: 5053105 (1991-10-01), Fox, III

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