Mask with programmed defects and method for the fabrication...

Details Mask with programmed defects and method for the fabrication... Mask with programmed defects and method for the fabrication...

2006-05-16

2006-05-16

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000, C430S030000, C430S323000, C430S324000

Reexamination Certificate

active

07045254

ABSTRACT:
A mask, and in particular a phase shift product mask, utilizes predetermined defects being produced during the fabrication thereof in the so-called “second layer” process. The defects are identified by markers in their direct vicinity. The markers are quadrangular and indicate, by virtue of their number in combination with their configuration, information about the respectively assigned defect, such as, for example, defect type, defect size, etc.

REFERENCES:
patent: 5085957 (1992-02-01), Hosono
patent: 5650854 (1997-07-01), Sugawara
patent: 6083275 (2000-07-01), Heng et al.
patent: 196 22 037 (1996-12-01), None

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