Mask validation using contours

Details Mask validation using contours Mask validation using contours

2006-06-29

2009-02-24

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C430S005000, C430S030000

Reexamination Certificate

active

07496881

ABSTRACT:
Embodiments of mask validation using simulated resist contours are presented herein. The mask validation system disclosed utilizes simulated resist contour of a mask useable for semiconductor device manufacture to validate printed resist geometries. The mask validation system further allows for the sampling of photolithographic simulations of the mask to obtain sampling points to form the simulated contours.

REFERENCES:
patent: 5553273 (1996-09-01), Liebmann
patent: 5900340 (1999-05-01), Reich et al.
patent: 6704695 (2004-03-01), Bula et al.
patent: 2005/0268256 (2005-12-01), Tsai et al.
Kubota, H., et al., “A Fast Method of Simulating Resist Pattern Contours Based on Mean Inhibitor Concentration”, Jpn. J. Appl. Phys., vol. 37 , pp. 5815-5820 (1998).

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